A Three-Dimensional Analysis of Magnetic Nanopattern Formation in FeRh Thin Films on MgO Substrates: Implications for Spintronic Devices

Silica and polystyrene spherical masks, nominally 500 and 1000 nm in diameter, respectively were applied on the surface of the sample in order to locally shadow the film against the effect of 110 keV energy neon-ion irradiation with fluences of 1015 and 1016 ions/cm2. Such nanosphere-lithography technique allows for projecting the mask geometry on the magnetic structure of the FeRh film.

Conversion-electron Mössbauer spectroscopy and magnetic force microscopy were used to determine the ferromagnetic ratio and the magnetic pattern in the samples, and nuclear resonance scattering of synchrotron radiation was applied to obtain the in-depth magnetic profile. From the results obtained, the possible three-dimensional (3D) structure of the created individual magnetic domains was also constructed. Overall, the great customizability of the presented nanosphere-lithography technique in FeRh thin film provides opportunities for developing cutting-edge spintronic applications.