Data pertaining to Si deposition via magnetron sputtering for photocatalytic conversion of water-A7-TUD

The research data is focused on successfully depositing n-Si thin films to be used as a tandem-cell, in conjunction with TiO(II), for photocatalytic conversion of water. The research was focused on acquiring the best (optimal) conditions for depositing n-Si thin films, using magnetron sputtering, and to investigate the effect of post-sputtering treatment on the crystallinity of the deposited films (rapid thermal annealing (RTA) and long cycle annealing (AN)).

The samples were successfully characterized via Raman Spectroscopy, X-ray Diffraction and Optical Transmission Spectroscopy to ascertain prevalent crystalline order and optical band gap, under different sputtering and post-sputtering conditions. By using the information from these characterization techniques relevant conclusions were drawn to ascertain the best possible deposition parameters to sputter n-Si on a silica substrate.