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Structure · dataset · 2026

Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(alkyl acrylates): An Experimental Study [* Cross-Reference *]

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A novel atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) approach toward the growth of conventional polymer layers is characterized and interpreted.

Description

A set of three methacrylate monomers (methyl, butyl, and glycidyl methacrylate) were investigated using ultrashort plasma discharges (ca. 100 ns) pulsed at various frequencies, covering a range of duty cycle from 0.1% to 0.000 316%. An unprecedented weight-average molar mass of 94 000 g mol-1 coupled to an outstanding thin film conformality and an excellent chemical functionalities retention was achieved for the best deposition conditions.

Insights into the growth mechanisms in AP-PiCVD and their dependence on the monomer's intrinsic properties are provided. ***This entry has been automatically imported via Infodoc(ASO) CSV by LIST harvest scripts. Please refer to doi.org/10.1021/acs.macromol.7b00461 for the original and latest version of the dataset and data downloads***

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